TY  - JOUR
  - Rasappa, S.; Borah, D.; Senthamaraikannan, R.; Faulkner, C. C.; Shaw, M. T.; Gleeson, P.; Holmes, J. D.; Morris, M. A.
  - 2012
  - November
  - Thin Solid Films
  - Block copolymer lithography: feature size control and extension by an over-etch technique
  - Published
  - ()
  - 522
  - 318
  - 323
  - Block copolymer lithography based on block copolymer (BCP) self-assembly can be used to develop soft mask nanoscale templates for subsequent pattern transfer to generate substrate features. Self-assembly of lamellar polystyrene-b-polymethylmethacrylate BCP of varying molecular weights to generate silicon nanoscale features is reported here. It has also been demonstrated that the feature size can be controlled by a plasma over-etch process and discussed
  - http://www.journals.elsevier.com/thin-solid-films/
DA  - 2012/11
ER  - 

@article{V179567481,
   = {Rasappa, S. and  Borah, D. and  Senthamaraikannan, R. and  Faulkner, C. C. and  Shaw, M. T. and  Gleeson, P. and  Holmes, J. D. and  Morris, M. A.},
   = {2012},
   = {November},
   = {Thin Solid Films},
   = {Block copolymer lithography: feature size control and extension by an over-etch technique},
   = {Published},
   = {()},
   = {522},
  pages = {318--323},
   = {{Block copolymer lithography based on block copolymer (BCP) self-assembly can be used to develop soft mask nanoscale templates for subsequent pattern transfer to generate substrate features. Self-assembly of lamellar polystyrene-b-polymethylmethacrylate BCP of varying molecular weights to generate silicon nanoscale features is reported here. It has also been demonstrated that the feature size can be controlled by a plasma over-etch process and discussed}},
   = {http://www.journals.elsevier.com/thin-solid-films/},
  source = {IRIS}
}