TY  - JOUR
  - Rasappa, S.; Borah, D.; Faulkner, C. C.; Lutz, T.; Shaw, M. T.; Holmes, J. D.; Morris, M. A.
  - 2013
  - April
  - Nanotechnology
  - Fabrication of a sub-10 nm silicon nanowire based ethanol sensor using block copolymer lithography
  - Published
  - WOS: 25 ()
  - 24
  - 6
  - 065503 (1)
  - 065503 (8)
  - This paper details the fabrication of ultrathin silicon nanowires (SiNWs) on a silicon-on-insulator (SOI) substrate as an electrode for the electro-oxidation and sensing of ethanol. The nanowire surfaces were prepared by a block copolymer (BCP) nanolithographictechnique using low molecular weight symmetric poly(styrene)-block-poly(methyl methacrylate) (PS-b-PMMA) to create a nanopattern which was transferred to the substrate using plasma etching. The BCP orientation was controlled using a hydroxyl-terminatedrandom polymer brush of poly(styrene)-random-poly(methyl methacrylate) (HO-PS-r-PMMA). TEM cross-sections of the resultant SiNWs indicate an anisotropic etch process with nanowires of sub-10 nm feature size. The SiNWs obtained by etching show high crystallinity and there is no evidence of defect inclusion or amorphous region production as a result of the pattern transfer process. The high density of SiNWs at the substrate surfaceallowed the fabrication of a sensor for cyclic voltammetric detection of ethanol. The sensor shows better sensitivity to ethanol and a faster response time compared to widely used polymer nanocomposite based sensors.
  - http://iopscience.iop.org/0957-4484
  - 10.1088/0957-4484/24/6/065503
DA  - 2013/04
ER  - 

@article{V209748662,
   = {Rasappa, S. and  Borah, D. and  Faulkner, C. C. and  Lutz, T. and  Shaw, M. T. and  Holmes, J. D. and  Morris, M. A.},
   = {2013},
   = {April},
   = {Nanotechnology},
   = {Fabrication of a sub-10 nm silicon nanowire based ethanol sensor using block copolymer lithography},
   = {Published},
   = {WOS: 25 ()},
   = {24},
   = {6},
  pages = {065503 (1)--065503 (8)},
   = {{This paper details the fabrication of ultrathin silicon nanowires (SiNWs) on a silicon-on-insulator (SOI) substrate as an electrode for the electro-oxidation and sensing of ethanol. The nanowire surfaces were prepared by a block copolymer (BCP) nanolithographictechnique using low molecular weight symmetric poly(styrene)-block-poly(methyl methacrylate) (PS-b-PMMA) to create a nanopattern which was transferred to the substrate using plasma etching. The BCP orientation was controlled using a hydroxyl-terminatedrandom polymer brush of poly(styrene)-random-poly(methyl methacrylate) (HO-PS-r-PMMA). TEM cross-sections of the resultant SiNWs indicate an anisotropic etch process with nanowires of sub-10 nm feature size. The SiNWs obtained by etching show high crystallinity and there is no evidence of defect inclusion or amorphous region production as a result of the pattern transfer process. The high density of SiNWs at the substrate surfaceallowed the fabrication of a sensor for cyclic voltammetric detection of ethanol. The sensor shows better sensitivity to ethanol and a faster response time compared to widely used polymer nanocomposite based sensors.}},
   = {http://iopscience.iop.org/0957-4484},
   = {10.1088/0957-4484/24/6/065503},
  source = {IRIS}
}