TY  - CONF
  - Borsetto, F.; Kosmala, B.; Fitzgerald, T. G.; Shaw, M. T.; Patterson, J.; Rapposelli, P.; O¿Callaghan, J. M.; Holmes, J. D.; Morris, M. A.
  - Material Science Forum
  - Polystyrene-polymethylmethacrylate block copolymers for lithographically assisted bottom-up assembly of nanostructures
  - 2007
  - January
  - Validated
  - 1
  - ()
  - Vol. 555
DA  - 2007/01
ER  - 

@inproceedings{V22017966,
   = {Borsetto, F. and  Kosmala, B. and  Fitzgerald, T. G. and  Shaw, M. T. and  Patterson, J. and  Rapposelli, P. and  O¿Callaghan, J. M. and  Holmes, J. D. and  Morris, M. A.},
   = {Material Science Forum},
   = {{Polystyrene-polymethylmethacrylate block copolymers for lithographically assisted bottom-up assembly of nanostructures}},
   = {2007},
   = {January},
   = {Validated},
   = {1},
   = {()},
   = {Vol. 555 },
  source = {IRIS}
}