Germanium oxide removal by citric acid and thiol passivation from citric acid terminated Ge(100)

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TY  - JOUR
  - Collins, G.; Aureau, D.; Holmes, J. D.; Etcheberry, A.; O’Dwyer, C.
  - 2014
  - December
  - Langmuir
  - Germanium oxide removal by citric acid and thiol passivation from citric acid terminated Ge(100)
  - Published
  - WOS: 33 ()
  - 30
  - 47
  - 14123
  - 14127
  - Many applications of germanium (Ge) are underpinned by effective oxide removal and surface passivation. This important surface treatment step often requires H−X (X = Cl, Br, I) or HF etchants. Here, we show that aqueous citric acid solutions are effective in the removal of GeOx. The stability of citric acid treated Ge(100) is compared to HF and HCl treated surfaces and analyzed by Xray photoelectron spectroscopy. Further Ge surface passivation was investigated by thiolation using alkane monothiols and dithiols. The organic passivation layers show good stability with no oxide regrowth observed after 3 days of ambient exposure.
  - Washington, DC, USA
  - http://pubs.acs.org/journal/langd5
  - 10.1021/la503819z
DA  - 2014/12
ER  - 
@article{V282719390,
   = {Collins, G. and  Aureau, D. and  Holmes, J. D. and  Etcheberry, A. and  O’Dwyer, C.},
   = {2014},
   = {December},
   = {Langmuir},
   = {Germanium oxide removal by citric acid and thiol passivation from citric acid terminated Ge(100)},
   = {Published},
   = {WOS: 33 ()},
   = {30},
   = {47},
  pages = {14123--14127},
   = {{Many applications of germanium (Ge) are underpinned by effective oxide removal and surface passivation. This important surface treatment step often requires H−X (X = Cl, Br, I) or HF etchants. Here, we show that aqueous citric acid solutions are effective in the removal of GeOx. The stability of citric acid treated Ge(100) is compared to HF and HCl treated surfaces and analyzed by Xray photoelectron spectroscopy. Further Ge surface passivation was investigated by thiolation using alkane monothiols and dithiols. The organic passivation layers show good stability with no oxide regrowth observed after 3 days of ambient exposure.}},
   = {Washington, DC, USA},
   = {http://pubs.acs.org/journal/langd5},
   = {10.1021/la503819z},
  source = {IRIS}
}
AUTHORSCollins, G.; Aureau, D.; Holmes, J. D.; Etcheberry, A.; O’Dwyer, C.
YEAR2014
MONTHDecember
JOURNAL_CODELangmuir
TITLEGermanium oxide removal by citric acid and thiol passivation from citric acid terminated Ge(100)
STATUSPublished
TIMES_CITEDWOS: 33 ()
SEARCH_KEYWORD
VOLUME30
ISSUE47
START_PAGE14123
END_PAGE14127
ABSTRACTMany applications of germanium (Ge) are underpinned by effective oxide removal and surface passivation. This important surface treatment step often requires H−X (X = Cl, Br, I) or HF etchants. Here, we show that aqueous citric acid solutions are effective in the removal of GeOx. The stability of citric acid treated Ge(100) is compared to HF and HCl treated surfaces and analyzed by Xray photoelectron spectroscopy. Further Ge surface passivation was investigated by thiolation using alkane monothiols and dithiols. The organic passivation layers show good stability with no oxide regrowth observed after 3 days of ambient exposure.
PUBLISHER_LOCATIONWashington, DC, USA
ISBN_ISSN
EDITION
URLhttp://pubs.acs.org/journal/langd5
DOI_LINK10.1021/la503819z
FUNDING_BODY
GRANT_DETAILS