IRIS publication 722077
Dielectric Characterization For Novel High-K Thin Films Using Microwave Techniques
RIS format for Endnote and similar
TY - - Other - Chen, WB, O'Sullivan, JA, McCarthy, KG - 2008 - August - Dielectric Characterization For Novel High-K Thin Films Using Microwave Techniques - Validated - 1 - () - This paper addresses the issue of novel high-k material thin film characterization through wafer-probe measurements and electromagnetic simulation (EM) of coplanar waveguides. The dielectric constant of an alumina substrate has been successfully extracted from s-parameter measurements of a coplanar waveguide. Verification lines on the impedance standard substrate (ISS) substrates have been used as a method to test a dielectric constant extraction technique and also to test the accuracy of EM simulations. The characteristic impedance and the effective dielectric constant for CPW are predicted using electromagnetic simulation.. - 631 - 634 DA - 2008/08 ER -
BIBTeX format for JabRef and similar
@misc{V722077, = {Other}, = {Chen, WB and O'Sullivan, JA and McCarthy, KG }, = {2008}, = {August}, = {Dielectric Characterization For Novel High-K Thin Films Using Microwave Techniques}, = {Validated}, = {1}, = {()}, = {{This paper addresses the issue of novel high-k material thin film characterization through wafer-probe measurements and electromagnetic simulation (EM) of coplanar waveguides. The dielectric constant of an alumina substrate has been successfully extracted from s-parameter measurements of a coplanar waveguide. Verification lines on the impedance standard substrate (ISS) substrates have been used as a method to test a dielectric constant extraction technique and also to test the accuracy of EM simulations. The characteristic impedance and the effective dielectric constant for CPW are predicted using electromagnetic simulation..}}, pages = {631--634}, source = {IRIS} }
Data as stored in IRIS
OTHER_PUB_TYPE | Other | ||
AUTHORS | Chen, WB, O'Sullivan, JA, McCarthy, KG | ||
YEAR | 2008 | ||
MONTH | August | ||
TITLE | Dielectric Characterization For Novel High-K Thin Films Using Microwave Techniques | ||
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STATUS | Validated | ||
PEER_REVIEW | 1 | ||
TIMES_CITED | () | ||
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ABSTRACT | This paper addresses the issue of novel high-k material thin film characterization through wafer-probe measurements and electromagnetic simulation (EM) of coplanar waveguides. The dielectric constant of an alumina substrate has been successfully extracted from s-parameter measurements of a coplanar waveguide. Verification lines on the impedance standard substrate (ISS) substrates have been used as a method to test a dielectric constant extraction technique and also to test the accuracy of EM simulations. The characteristic impedance and the effective dielectric constant for CPW are predicted using electromagnetic simulation.. | ||
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START_PAGE | 631 | ||
END_PAGE | 634 | ||
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