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Dive into the research topics where Eoin Sheehan is active. These topic labels come from the works of this person. Together they form a unique fingerprint.
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Sources of variation in piezoresistive stress sensor measurements
Slattery, O., O'Mahoney, D., Sheehan, E. & Waldron, F., Mar 2004, In: IEEE Transactions on Components and Packaging Technologies. 27, 1, p. 81-86 6 p.Research output: Contribution to journal › Article › peer-review
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Predicting thermomechanical stress using mesmeric methodology
Slattery, O., O'Mahoney, D., Sheehan, E., Waldron, F. & McCarthy, G., 2002, p. 884-891. 8 p.Research output: Contribution to conference › Paper › peer-review
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Predicting thermomechanical stress using MESMERIC methodology
Slattery, O., O'Mahoney, D., Sheehan, E., Waldron, F. & McCarthy, G., 2002, ITHERM 2002 - 8th Intersociety Conference on Thermal and Thermomechanical Phenomena in Electronic Systems. Sammakia, B. G., Joshi, Y. K., Subbarayan, G., Amon, C. H., Ramakrishna, K. & Sathe, S. B. (eds.). IEEE Computer Society, p. 884-891 8 p. 1012548. (InterSociety Conference on Thermal and Thermomechanical Phenomena in Electronic Systems, ITHERM; vol. 2002-January).Research output: Chapter in Book/Report/Conference proceedings › Conference proceeding › peer-review
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Plasma process induced degradation of thin inter-polysilicon dielectric layers
Hurley, P. K., Rodrigues, R., Kay, P., Thakur, R. P. S., Clarke, D., Sheehan, E. & Mathewson, A., 1999, p. 45-48. 4 p.Research output: Contribution to conference › Paper › peer-review
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Hot carrier degradation mechanisms in sub-micron p channel MOSFETs: Impact on low frequency (1/f) noise behaviour
Sheehan, E., Hurley, P. K. & Mathewson, A., 1998, In: Microelectronics Reliability. 38, 6-8, p. 931-936 6 p.Research output: Contribution to journal › Article › peer-review