Personal profile
Biography
Dr. Liu is currently a researcher at Tyndall National Institute and is leading projects funded by Research Ireland, Horizon Europe and Industry on the atomic level processing chemistry.
Dr. Liu led the group’s work on collaborative projects from Science Foundation Ireland (NITRALD, 2019 – 2022), European Union (Chips JU, CONCEPT 2024 – 2025), VistaMilk 2 (Emerging Technologies, 2025 - ), and Industry work with Applied Materials and ASM (2021 - 2024).
Fingerprint
Dive into the research topics where Ji Liu is active. These topic labels come from the works of this person. Together they form a unique fingerprint.
- 1 Similar Profiles
Collaborations and top research areas from the last five years
Recent external collaboration on country/territory level. Dive into details by clicking on the dots or
-
Amido-Amine Co(II) Precursor-Based Atomic/Molecular Layer Deposition Processes for Cobalt-Organic Thin Films and Their Thermal Conversion to CoO Thin Films
Jussila, T., Obenlüneschloß, J., Liu, J., Partanen, O., Vasala, S., Rogalla, D., Glatzel, P., Nolan, M., Devi, A. & Karppinen, M., 2026, (Accepted/In press) In: Advanced Materials Technologies.Research output: Contribution to journal › Article › peer-review
Open Access -
Prediction of atomic layer deposition chemistry of Ru onto TaN for interconnect stack using the RuO4 precursor
Mullins, R., Liu, J. & Nolan, M., 1 Mar 2026, In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 44, 2, 022402.Research output: Contribution to journal › Article › peer-review
Open Access -
High Quality Crystalline VN Thin Films via MOCVD from a New Vanadium Precursor: Linking Growth Chemistry to Functional Catalytic Surfaces
Glauber, J.-P., Lorenz, J., Liu, J., Seifert, M., Hoffmann, V., Abad, C., Rogalla, D., Harms, C., Wark, M., Nolan, M. & Devi, A., 25 Jun 2025Research output: Other output
-
Overcoming the Critical Thickness Limit: Interfacial Control of Crystallization Pathways in Atomic-Scale Dielectric Thin Films
Trinh, N. L., Kim, W., Lee, M., Gu, B., Thi, S. V., Liu, J., Nolan, M., Kim, H.-M., Kim, H., Kim, J., Kang, Y. & Lee, H.-B.-R., 30 Oct 2025Research output: Other output
-
Prediction of ALD Chemistry for the Incorporation of Ru into TaN using the RuO4 Precursor
Mullins, R., Liu, J. & Nolan, M., 5 Sep 2025Research output: Other output