Research output per year
Research output per year
Personal profile
Biography
Dr. Liu is currently a researcher at Tyndall National Institute and is leading projects funded by Research Ireland, Horizon Europe and Industry on the atomic level processing chemistry.
Dr. Liu led the group’s work on collaborative projects from Science Foundation Ireland (NITRALD, 2019 – 2022), European Union (Chips JU, CONCEPT 2024 – 2025), VistaMilk 2 (Emerging Technologies, 2025 - ), and Industry work with Applied Materials and ASM (2021 - 2024).
Research Interests
Dr Liu's research interests lie mainly on the simulation of atomic level processing chemistrty. Particularly, I am interested in predicting the deposition chemistry of metals, metal oxides, and metal nitrides with collaborators and industry partners.
Research Grants
|
Grant type |
Funding source |
Amount |
Period |
| Support Grant | Enterprise Ireland (ERC Proposal Support) | €15,909.00 | 2022 - 2023 |
| Travel Grant | Royal Irish Academy (Charlemont Grant) | €2495.00 | 2026 - 2026 |
Expertise related to UN Sustainable Development Goals
In 2015, UN member states agreed to 17 global Sustainable Development Goals (SDGs) to end poverty, protect the planet and ensure prosperity for all. This person’s work contributes towards the following SDG(s):
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SDG 7 Affordable and Clean Energy -
SDG 13 Climate Action
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Collaborations and top research areas from the last five years
Recent external collaboration on country/territory level. Dive into details by clicking on the dots or
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Prediction of atomic layer deposition chemistry of Ru onto TaN for interconnect stack using the RuO4 precursor
Mullins, R., Liu, J. & Nolan, M., 1 Mar 2026, In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 44, 2, 022402.Research output: Contribution to journal › Article › peer-review
Open Access -
Nucleation of Co and Ru Precursors on Silicon with Different Surface Terminations: Impact on Nucleation Delay
Liu, J., Mullins, R., Lu, H., Zhang, D. W. & Nolan, M., 20 Jul 2023, In: Journal of Physical Chemistry C. 127, 28, p. 13651-13658 8 p.Research output: Contribution to journal › Article › peer-review
Open Access -
Amido-Amine Co(II) Precursor-Based Atomic/Molecular Layer Deposition Processes for Cobalt-Organic Thin Films and Their Thermal Conversion to CoO Thin Films
Jussila, T., Obenlüneschloß, J., Liu, J., Partanen, O., Vasala, S., Rogalla, D., Glatzel, P., Nolan, M., Devi, A. & Karppinen, M., 2026, (Accepted/In press) In: Advanced Materials Technologies.Research output: Contribution to journal › Article › peer-review
Open Access -
High Quality Crystalline VN Thin Films via MOCVD from a New Vanadium Precursor: Linking Growth Chemistry to Functional Catalytic Surfaces
Glauber, J.-P., Lorenz, J., Liu, J., Seifert, M., Hoffmann, V., Abad, C., Rogalla, D., Harms, C., Wark, M., Nolan, M. & Devi, A., 25 Jun 2025Research output: Other output
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Overcoming the Critical Thickness Limit: Interfacial Control of Crystallization Pathways in Atomic-Scale Dielectric Thin Films
Trinh, N. L., Kim, W., Lee, M., Gu, B., Thi, S. V., Liu, J., Nolan, M., Kim, H.-M., Kim, H., Kim, J., Kang, Y. & Lee, H.-B.-R., 30 Oct 2025Research output: Other output