I am Group Head of the Materials Modelling for Devices Group at Tyndall, CMOS++ Research Cluster Lead and member of Tyndall's Senior Leadership team. Our expertise focuses on atomistic simulation of surface chemistry, with a particular focus on simulation of atomic level processing, including atomic layer deposition, atomic layer etching and hybrid materials (molecular layer deposition and sequential infiltration synthesis). We have used first principles density functional theory (DFT) and recently started with molecular dynamics and machine learning.

We work with many leading European and international research groups to explore new precursor chemistries for ALD/ALD/MLD, surface chemistries in processing to predict and understand new materials processing chemistries.

I am a PI on the Chips JU Pilot Line NanoIC working on p-type oxide semiconductors, ALD and contact metals. Other projects where I am PI include Chips JU funded GENESIS on sustainable semiconductor processing, Semiconductor Research Corporation with Intel on ALE and an AMBER Centre project on low friction materials. 

Atomic layer deposition of metals using plasma processing

Atomic layer etching of high-k metals oxides with HF - role of phase and surface facet on ALE chemistry

Alternatives to HF for oxide ALE

Metal ALE

Hybrid ALD/MLD chemistry for inorganic-organic materials

Sequential infiltration synthesis of hybrid materials

Simulation methodology for metal morphology prediction - interconnect materials

PFAS sensors

Machine learning for activation barriers

I previously taught in two modules in UCC School of Chemistry:

Structure, bonding and quantum mechanics.

Interfaces, Microscopy and Modelling. 

Michael Sweetman

Saba Abdul Shakoor

Florentino Silva (co-supervised with L. Keeney)

Debismitta Dutta 

(co-supervised with L. Keeney)

Rita Mullins

Arbresha Muriqi

Cara-Lena Nies

Stephen Rhatigan

Drahomir Chovan

Merid Legesse

Anna Iwaszuk