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Dive into the research topics where Rita Mullins is active. These topic labels come from the works of this person. Together they form a unique fingerprint.
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Prediction of atomic layer deposition chemistry of Ru onto TaN for interconnect stack using the RuO4 precursor
Mullins, R., Liu, J. & Nolan, M., 1 Mar 2026, In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 44, 2, 022402.Research output: Contribution to journal › Article › peer-review
Open Access -
Prediction of ALD Chemistry for the Incorporation of Ru into TaN using the RuO4 Precursor
Mullins, R., Liu, J. & Nolan, M., 5 Sep 2025Research output: Other output
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Self-reducing precursors for aluminium metal thin films: evaluation of stable aluminium hydrides for vapor phase aluminium deposition
Huster, N., Mullins, R., Nolan, M. & Devi, A., 11 Apr 2024, In: Dalton Transactions. 53, 18, p. 7711-7720 10 p.Research output: Contribution to journal › Article › peer-review
Open Access -
Nucleation of Co and Ru Precursors on Silicon with Different Surface Terminations: Impact on Nucleation Delay
Liu, J., Mullins, R., Lu, H., Zhang, D. W. & Nolan, M., 20 Jul 2023, In: Journal of Physical Chemistry C. 127, 28, p. 13651-13658 8 p.Research output: Contribution to journal › Article › peer-review
Open Access -
Origin of enhanced thermal atomic layer etching of amorphous HfO2
Mullins, R., Gutiérrez Moreno, J. J. & Nolan, M., 1 Mar 2022, In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 40, 2, 022604.Research output: Contribution to journal › Article › peer-review
Open Access