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15nm-WFIN high-performance low-defectivity strained-germanium pFinFETs with low temperature STI-last process

  • J. Mitard
  • , L. Witters
  • , R. Loo
  • , S. H. Lee
  • , J. W. Sun
  • , J. Franco
  • , L. Ragnarsson
  • , A. Brand
  • , X. Lu
  • , N. Yoshida
  • , G. Eneman
  • , D. P. Brunco
  • , M. Vorderwestner
  • , P. Storck
  • , A. P. Milenin
  • , A. Hikavyy
  • , N. Waldron
  • , P. Favia
  • , D. Vanhaeren
  • , A. Vanderheyden
    • R. Olivier, H. Mertens, H. Arimura, S. Sonja, C. Vrancken, H. Bender, P. Eyben, K. Barla, S. G. Lee, N. Horiguchi, N. Collaert, A. V.Y. Thean

Research output: Chapter in Book/Report/Conference proceedings › Conference proceeding › peer-review

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