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3D sequential low temperature top tier devices using dopant activation with excimer laser anneal and strained silicon as performance boosters

  • A. Vandooren
  • , Z. Wu
  • , N. Parihar
  • , J. Franco
  • , B. Parvais
  • , P. Matagne
  • , H. Debruyn
  • , G. Mannaert
  • , K. Devriendt
  • , L. Teugels
  • , E. Vecchio
  • , D. Radisic
  • , E. Rosseel
  • , A. Hikavyy
  • , B. T. Chan
  • , N. Waldron
  • , J. Mitard
  • , G. Besnard
  • , A. Alvarez
  • , G. Gaudin
    • W. Schwarzenbach, I. Radu, B. Y. Nguyen, K. Huet, T. Tabata, F. Mazzamuto, S. Demuynck, J. Boemmels, N. Collaert, N. Horiguchi

Research output: Chapter in Book/Report/Conference proceedings › Conference proceeding › peer-review

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