Abstract
Bistable gated bipolar (BGB) devices, a novel negative differential resistance (NDR) device, is investigated in this paper. Experimental demonstration for both n-channel and p-channel devices is carried out in a partially depleted silicon-on-insulator technology. The temperature dependence of its NDR characteristics is measured and found to be in good agreement with analytical models. A feasible scheme is proposed to implement this device in scaled CMOS technologies. As the basic principle for applications, the measured hysteresis characteristic of a storage cell utilizing the BGB device is reported for the first time. Potential applications for logic and memory are also discussed.
| Original language | English |
|---|---|
| Pages (from-to) | 2589-2597 |
| Number of pages | 9 |
| Journal | IEEE Transactions on Electron Devices |
| Volume | 53 |
| Issue number | 10 |
| DOIs | |
| Publication status | Published - 2006 |
Keywords
- MOS devices
- Negative resistance devices
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