A Liquid Ge(IV) Precursor for Low Temperature Plasma Enhanced Atomic Layer Deposition of Germanium Oxide Thin Films
- Florian Preischel
- , Karl Rönnby
- , Martin Wilken
- , Jean Pierre Glauber
- , Samuel Froeschke
- , Detlef Rogalla
- , Thomas Gemming
- , Alexey A. Popov
- , Peter Dement
- , Michael Nolan
- , Anjana Devi
- Ruhr University Bochum
- Leibniz Institute for Solid State and Materials Research Dresden
- Fraunhofer Institute for Microelectronic Circuits and Systems
- Technische Universität Dresden
Research output: Contribution to journal › Article › peer-review