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A Liquid Ge(IV) Precursor for Low Temperature Plasma Enhanced Atomic Layer Deposition of Germanium Oxide Thin Films

  • Florian Preischel
  • , Karl Rönnby
  • , Martin Wilken
  • , Jean Pierre Glauber
  • , Samuel Froeschke
  • , Detlef Rogalla
  • , Thomas Gemming
  • , Alexey A. Popov
  • , Peter Dement
  • , Michael Nolan
  • , Anjana Devi
  • Ruhr University Bochum
  • Leibniz Institute for Solid State and Materials Research Dresden
  • Fraunhofer Institute for Microelectronic Circuits and Systems
  • Technische Universität Dresden

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