A Novel Simple Process for the Deposition of Thin Films of CuInSe2 by MOCVD

A Novel Simple Process for the Deposition of Thin Films of CuInSe₂ by MOCVD

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@article{cb12d5043d694565b468211c29763a83,

title = "A Novel Simple Process for the Deposition of Thin Films of CuInSe2 by MOCVD",

author = "John McAleese and Paul O'Brien and Otway, \{David J.\}",

year = "1998",

month = may,

doi = "10.1002/(SICI)1521-3862(199805)04:03<94::AID-CVDE94>3.0.CO;2-0",

language = "English",

volume = "4",

pages = "94--96",

journal = "Chemical Vapor Deposition",

issn = "0948-1907",

publisher = "Wiley-VCH Verlag",

number = "3",

}

TY - JOUR

T1 - A Novel Simple Process for the Deposition of Thin Films of CuInSe2 by MOCVD

AU - McAleese, John

AU - O'Brien, Paul

AU - Otway, David J.

PY - 1998/5

Y1 - 1998/5

UR - https://www.scopus.com/pages/publications/0032074808

U2 - 10.1002/(SICI)1521-3862(199805)04:03<94::AID-CVDE94>3.0.CO;2-0

DO - 10.1002/(SICI)1521-3862(199805)04:03<94::AID-CVDE94>3.0.CO;2-0

M3 - Article

AN - SCOPUS:0032074808

SN - 0948-1907

VL - 4

SP - 94

EP - 96

JO - Chemical Vapor Deposition

JF - Chemical Vapor Deposition

IS - 3

ER -