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A study of the electrochemical performance of vanadium oxide thin films grown by atmospheric pressure chemical vapour deposition

  • D. Vernardou
  • , P. Paterakis
  • , H. Drosos
  • , E. Spanakis
  • , I. M. Povey
  • , M. E. Pemble
  • , E. Koudoumas
  • , N. Katsarakis

Research output: Contribution to journalArticlepeer-review

Abstract

Thin films of vanadium oxide were deposited on glass substrates at 450 oC by atmospheric pressure chemical vapour deposition. The effect of the vanadium tetrachloride to water precursor ratio on the structural and morphological properties of the films was investigated. The water concentration was observed to strongly affect the vanadium oxidation state and the morphological characteristics of the films. The importance of achieving single-phase of a particular oxidation state towards the improvement of the electrochemical performance of thin films grown by atmospheric pressure CVD is highlighted.

Original languageEnglish
Pages (from-to)2842-2847
Number of pages6
JournalSolar Energy Materials and Solar Cells
Volume95
Issue number10
DOIs
Publication statusPublished - Oct 2011

Keywords

  • Atmospheric pressure chemical vapour deposition
  • Cyclic voltammetry
  • Electrochemical properties
  • Electrochromics
  • Vanadium oxides

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