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A systematic study of ($ hbox ${$NH$}$ _ ${$4$}$ $) 2S passivation (22% 10% 5% or 1%) on the interface properties of the $ hbox ${$Al$}$ _ ${$2$}$ hbox ${$O$}$ _ ${$3$}$/hbox ${$In$}$ _ ${$0.53$}$ hbox ${$Ga$}$ _ ${$0.47$}$ hbox ${$As$}$/hbox ${$InP$}$ $ system for $ n $-type and $ p $-type In0. 53Ga0. 47As epitaxial layers

Research output: Contribution to journalArticlepeer-review

Original languageUndefined/Unknown
JournalJ. Appl. Phys.
Publication statusPublished - 2011

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