A thermal study of multilayer RRAMs based on HfO2 and Al2O3 oxides

Manuel Cazorla; Samuel Aldana; Marcos Maestro-Izquierdo; Mireia Bargalló Gonzalez; Francisco Jiménez-Molinos; Francesca Campabadal; Juan Bautista Roldán Aranda

A thermal study of multilayer RRAMs based on HfO2 and Al2O3 oxides

Manuel Cazorla
, Samuel Aldana
, Marcos Maestro-Izquierdo
, Mireia Bargalló Gonzalez
, Francisco Jiménez-Molinos
, Francesca Campabadal
, Juan Bautista Roldán Aranda

Research output: Contribution to conference › Poster › peer-review

Original language	English
Publication status	Published - Jun 2018
Externally published	Yes
Event	WODIM 2018 - 20th Workshop on Dielectrics in Microelectronics, 2018 - , Germany Duration: 1 Jun 2018 → …

Conference

Conference	WODIM 2018 - 20th Workshop on Dielectrics in Microelectronics, 2018
Country/Territory	Germany
Period	1/06/18 → …

Cite this

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title = "A thermal study of multilayer RRAMs based on HfO2 and Al2O3 oxides",

author = "Manuel Cazorla and Samuel Aldana and Marcos Maestro-Izquierdo and \{Bargall{\'o} Gonzalez\}, Mireia and Francisco Jim{\'e}nez-Molinos and Francesca Campabadal and \{Rold{\'a}n Aranda\}, \{Juan Bautista\}",

year = "2018",

month = jun,

language = "English",

note = "WODIM 2018 - 20th Workshop on Dielectrics in Microelectronics, 2018<br/> ; Conference date: 01-06-2018",

}

TY - CONF

T1 - A thermal study of multilayer RRAMs based on HfO2 and Al2O3 oxides

AU - Cazorla, Manuel

AU - Aldana, Samuel

AU - Maestro-Izquierdo, Marcos

AU - Bargalló Gonzalez, Mireia

AU - Jiménez-Molinos, Francisco

AU - Campabadal, Francesca

AU - Roldán Aranda, Juan Bautista

PY - 2018/6

Y1 - 2018/6

M3 - Poster

T2 - WODIM 2018 - 20th Workshop on Dielectrics in Microelectronics, 2018<br/>

Y2 - 1 June 2018

ER -