Advanced channel materials for the semiconductor industry
- N. Collaert
- , A. Alian
- , H. Arimura
- , G. Boccardi
- , G. Eneman
- , D. Lin
- , J. Mitard
- , S. Sioncke
- , N. Waldron
- , L. Witters
- , X. Zhou
- , A. V.Y. Thean
- Interuniversitair Micro-Elektronica Centrum
Research output: Chapter in Book/Report/Conference proceedings › Conference proceeding › peer-review