Advanced process development using numerical simulation

R. Duffy; A. Concannon; A. Mathewson

Advanced process development using numerical simulation

R. Duffy
, A. Concannon
, A. Mathewson

University College Cork

Research output: Contribution to journal › Article › peer-review

Abstract

In 1993 the flash EEPROM share of the memory market increased by 73%, establishing it as the fastest growing segment of the non-volatile memory market [1]. The aim of this work is to develop and integrate a flash EEPROM memory module into an existing CMOS process without compromising its performance. A design methodology is presented which demonstrates the use of numerical simulation in the evaluation of different process options, before committing the design to silicon.

Original language	English
Pages (from-to)	14/1-14/6
Journal	IEE Colloquium (Digest)
Issue number	33
Publication status	Published - 1995
Event	IEE Electronics Division Colloquium on Advanced MOS and BI-Polar Devices - London, UK Duration: 14 Feb 1995 → 14 Feb 1995

Cite this

@article{646091fe39e24005a620c184c56e4fc8,

title = "Advanced process development using numerical simulation",

abstract = "In 1993 the flash EEPROM share of the memory market increased by 73\%, establishing it as the fastest growing segment of the non-volatile memory market [1]. The aim of this work is to develop and integrate a flash EEPROM memory module into an existing CMOS process without compromising its performance. A design methodology is presented which demonstrates the use of numerical simulation in the evaluation of different process options, before committing the design to silicon.",

author = "R. Duffy and A. Concannon and A. Mathewson",

year = "1995",

language = "English",

pages = "14/1--14/6",

journal = "IEE Colloquium (Digest)",

issn = "0963-3308",

publisher = "Institute of Electrical Engineers",

number = "33",

note = "IEE Electronics Division Colloquium on Advanced MOS and BI-Polar Devices ; Conference date: 14-02-1995 Through 14-02-1995",

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TY - JOUR

T1 - Advanced process development using numerical simulation

AU - Duffy, R.

AU - Concannon, A.

AU - Mathewson, A.

PY - 1995

Y1 - 1995

N2 - In 1993 the flash EEPROM share of the memory market increased by 73%, establishing it as the fastest growing segment of the non-volatile memory market [1]. The aim of this work is to develop and integrate a flash EEPROM memory module into an existing CMOS process without compromising its performance. A design methodology is presented which demonstrates the use of numerical simulation in the evaluation of different process options, before committing the design to silicon.

AB - In 1993 the flash EEPROM share of the memory market increased by 73%, establishing it as the fastest growing segment of the non-volatile memory market [1]. The aim of this work is to develop and integrate a flash EEPROM memory module into an existing CMOS process without compromising its performance. A design methodology is presented which demonstrates the use of numerical simulation in the evaluation of different process options, before committing the design to silicon.

UR - https://www.scopus.com/pages/publications/0029541974

M3 - Article

AN - SCOPUS:0029541974

SN - 0963-3308

SP - 14/1-14/6

JO - IEE Colloquium (Digest)

JF - IEE Colloquium (Digest)

IS - 33

T2 - IEE Electronics Division Colloquium on Advanced MOS and BI-Polar Devices

Y2 - 14 February 1995 through 14 February 1995

ER -

Advanced process development using numerical simulation

Abstract

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