@inbook{8a8a14cbc17f40138a45e365ed648d11,
title = "Advanced test structure design for dielectric characterisation of novel high-K materials",
abstract = "The extremely high level of integration currently required within the wireless industry poses significant challenges at all technology steps from materials through processing to packaging. Capacitor design is a very important element of this technology integration challenge. Recently there has been strong interest in the use of PMNT (Pb(Mg,Nb)TiO3) as a thin-film layer in semiconductor processes [1]. The high dielectric constant of PMNT makes it an attractive material for the fabrication of MIM (Metal/Insulator/Metal) decoupling capacitors. Before PMNT can be used in conjunction with a modern Si process for capacitor design the PMNT layer must be accurately characterised. This paper addresses the issue of thin-film characterisation through wafer-probe measurements and electromagnetic simulation (EM) of coplanar waveguides. Based on the results obtained a design methodology for optimum test structure layout is presented.",
author = "O'Sullivan, \{John A.\} and Wenbin Chen and McCarthy, \{Kevin G.\} and Crean, \{Gabriel M.\}",
year = "2008",
doi = "10.1109/ICMTS.2008.4509335",
language = "English",
isbn = "9781424418008",
series = "IEEE International Conference on Microelectronic Test Structures",
pages = "180--184",
booktitle = "2008 IEEE Conference on Microelectronic Test Structures, ICMTS",
note = "2008 IEEE Conference on Microelectronic Test Structures, ICMTS ; Conference date: 24-03-2008 Through 27-03-2008",
}