AlInGaAs surface normal photodiode for 2 μm optical communication systems

Research output: Chapter in Book/Report/Conference proceedingsChapterpeer-review

Abstract

High bandwidth 2 μm wavelength surface normal p-i-n photodiodes using a high indium-content InGaAs strain-relaxed absorbing layer clad by p and n doped AlInGaAs layers are realised. A parabolic grading was used to relax the lattice constant from that of the InP substrate. We compare structures with different p-doping profiles and absorber thicknesses to achieve a 3-dB bandwidth of around 10 GHz while maintaining a photoresponsivity of 0.93 A/W. A clear opening of the 10 Gbit/s eye pattern was obtained with an input power of-3.07 dBm. By temperature-control of the mesa passivation process the device leakage was reduced to 0.52 μA at-5 V bias.

Original languageEnglish
Title of host publication2015 IEEE Photonics Conference, IPC 2015
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages456-459
Number of pages4
ISBN (Electronic)9781479974658
DOIs
Publication statusPublished - 9 Nov 2015
EventIEEE Photonics Conference, IPC 2015 - Reston, United States
Duration: 30 Aug 201531 Aug 2015

Publication series

Name2015 IEEE Photonics Conference, IPC 2015

Conference

ConferenceIEEE Photonics Conference, IPC 2015
Country/TerritoryUnited States
CityReston
Period30/08/1531/08/15

Keywords

  • 2 μm
  • High speed photodiode
  • InGaAs

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