Amido-Amine Co(II) Precursor-Based Atomic/Molecular Layer Deposition Processes for Cobalt-Organic Thin Films and Their Thermal Conversion to CoO Thin Films
- Topias Jussila
- , Jorit Obenlüneschloß
- , Ji Liu
- , Olga Partanen
- , Sami Vasala
- , Detlef Rogalla
- , Pieter Glatzel
- , Michael Nolan
- , Anjana Devi
- , Maarit Karppinen
- Aalto University
- Ruhr University Bochum
- University College Cork
- European Synchrotron Radiation Facility
- Leibniz Institute for Solid State and Materials Research Dresden
- Fraunhofer Institute for Microelectronic Circuits and Systems
- Technische Universität Dresden
Research output: Contribution to journal › Article › peer-review