An insitu hard mask block copolymer approach for the fabrication of ordered, large scale, horizontally aligned, Si nanowire arrays on Si substrate

  • Tandra Ghoshal
  • , Ramsankar Senthamaraikannan
  • , Matthew T. Shaw
  • , Justin D. Holmes
  • , Michael A. Morris

Research output: Chapter in Book/Report/Conference proceedings › Conference proceeding › peer-review

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