Atmospheric pressure glow discharge CVD of Al2O3 thin films

John L. Hodgkinson; David W. Sheel; Heather M. Yates; Martyn E. Pemble

doi:10.1002/ppap.200600042

Atmospheric pressure glow discharge CVD of Al₂O₃ thin films

John L. Hodgkinson
, David W. Sheel
, Heather M. Yates
, Martyn E. Pemble

University College Cork

Research output: Contribution to journal › Article › peer-review

Abstract

We report for the first time deposition of aluminium oxide thin films by APGD, plasma-enhanced CVD. This approach allows deposition at substantially lower substrate temperatures than normally used in atmospheric pressure based processing. The films are analysed by SEM, XPS, RBS, XRD, and optical properties. It is demonstrated that the APGD approach yields films which are essentially smooth, conformal and free from pinholes or other imperfections.

Original language	English
Pages (from-to)	597-605
Number of pages	9
Journal	Plasma Processes and Polymers
Volume	3
Issue number	8
DOIs	https://doi.org/10.1002/ppap.200600042
Publication status	Published - 11 Oct 2006

Keywords

Alumina
Atmospheric pressure glow discharge
Films
Plasma-enhanced chemical vapor deposition (PE-CVD)

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10.1002/ppap.200600042

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title = "Atmospheric pressure glow discharge CVD of Al2O3 thin films",

abstract = "We report for the first time deposition of aluminium oxide thin films by APGD, plasma-enhanced CVD. This approach allows deposition at substantially lower substrate temperatures than normally used in atmospheric pressure based processing. The films are analysed by SEM, XPS, RBS, XRD, and optical properties. It is demonstrated that the APGD approach yields films which are essentially smooth, conformal and free from pinholes or other imperfections.",

keywords = "Alumina, Atmospheric pressure glow discharge, Films, Plasma-enhanced chemical vapor deposition (PE-CVD)",

author = "Hodgkinson, \{John L.\} and Sheel, \{David W.\} and Yates, \{Heather M.\} and Pemble, \{Martyn E.\}",

year = "2006",

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doi = "10.1002/ppap.200600042",

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AU - Hodgkinson, John L.

AU - Sheel, David W.

AU - Yates, Heather M.

AU - Pemble, Martyn E.

PY - 2006/10/11

Y1 - 2006/10/11

N2 - We report for the first time deposition of aluminium oxide thin films by APGD, plasma-enhanced CVD. This approach allows deposition at substantially lower substrate temperatures than normally used in atmospheric pressure based processing. The films are analysed by SEM, XPS, RBS, XRD, and optical properties. It is demonstrated that the APGD approach yields films which are essentially smooth, conformal and free from pinholes or other imperfections.

AB - We report for the first time deposition of aluminium oxide thin films by APGD, plasma-enhanced CVD. This approach allows deposition at substantially lower substrate temperatures than normally used in atmospheric pressure based processing. The films are analysed by SEM, XPS, RBS, XRD, and optical properties. It is demonstrated that the APGD approach yields films which are essentially smooth, conformal and free from pinholes or other imperfections.

KW - Alumina

KW - Atmospheric pressure glow discharge

KW - Films

KW - Plasma-enhanced chemical vapor deposition (PE-CVD)

UR - https://www.scopus.com/pages/publications/33750319968

U2 - 10.1002/ppap.200600042

DO - 10.1002/ppap.200600042

M3 - Article

AN - SCOPUS:33750319968

SN - 1612-8850

VL - 3

SP - 597

EP - 605

JO - Plasma Processes and Polymers

JF - Plasma Processes and Polymers

IS - 8

ER -

Atmospheric pressure glow discharge CVD of Al₂O₃ thin films

Abstract

Keywords

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