Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices

Melissa M. McCarthy; Arnaud Walter; Soo Jin Moon; Nakita K. Noel; Shane O'Brien; Martyn E. Pemble; Sylvain Nicolay; Bernard Wenger; Henry J. Snaith; Ian M. Povey

doi:10.1557/adv.2018.515

Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices

Melissa M. McCarthy
, Arnaud Walter
, Soo Jin Moon
, Nakita K. Noel
, Shane O'Brien
, Martyn E. Pemble
, Sylvain Nicolay
, Bernard Wenger
, Henry J. Snaith
, Ian M. Povey

Research output: Contribution to journal › Article › peer-review

Abstract

Amorphous TiO2 and SnO2 electron transport layers (ETLs) were deposited by low-Temperature atomic layer deposition (ALD). Surface morphology and x-ray photoelectron spectroscopy (XPS) indicate uniform and pinhole free coverage of these ALD hole blocking layers. Both mesoporous and planar perovskite solar cells were fabricated based on these thin films with aperture areas of 1.04 cm² for TiO2 and 0.09 cm² and 0.70 cm² for SnO2. The resulting cell performance of 18.3 % power conversion efficiency (PCE) using planar SnO2 on 0.09 cm² and 15.3 % PCE using mesoporous TiO2 on 1.04 cm² active areas are discussed in conjunction with the significance of growth parameters and ETL composition.

Original language	English
Pages (from-to)	3075-3084
Number of pages	10
Journal	MRS Advances
Volume	3
Issue number	51
DOIs	https://doi.org/10.1557/adv.2018.515
Publication status	Published - 2018

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

SDG 7 Affordable and Clean Energy

Keywords

atomic layer deposition
perovskites
photovoltaic
thin film

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10.1557/adv.2018.515

https://hdl.handle.net/10468/7616Licence: CC BY-NC-ND

Cite this

@article{cf198ef060c341bb90a1f6f34b863f21,

title = "Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices",

abstract = "Amorphous TiO2 and SnO2 electron transport layers (ETLs) were deposited by low-Temperature atomic layer deposition (ALD). Surface morphology and x-ray photoelectron spectroscopy (XPS) indicate uniform and pinhole free coverage of these ALD hole blocking layers. Both mesoporous and planar perovskite solar cells were fabricated based on these thin films with aperture areas of 1.04 cm2 for TiO2 and 0.09 cm2 and 0.70 cm2 for SnO2. The resulting cell performance of 18.3 \% power conversion efficiency (PCE) using planar SnO2 on 0.09 cm2 and 15.3 \% PCE using mesoporous TiO2 on 1.04 cm2 active areas are discussed in conjunction with the significance of growth parameters and ETL composition.",

keywords = "atomic layer deposition, perovskites, photovoltaic, thin film",

author = "McCarthy, \{Melissa M.\} and Arnaud Walter and Moon, \{Soo Jin\} and Noel, \{Nakita K.\} and Shane O'Brien and Pemble, \{Martyn E.\} and Sylvain Nicolay and Bernard Wenger and Snaith, \{Henry J.\} and Povey, \{Ian M.\}",

note = "Publisher Copyright: Copyright {\textcopyright} Materials Research Society 2018{\^A}.",

year = "2018",

doi = "10.1557/adv.2018.515",

language = "English",

volume = "3",

pages = "3075--3084",

journal = "MRS Advances",

issn = "2731-5894",

publisher = "Springer Nature",

number = "51",

}

TY - JOUR

T1 - Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices

AU - McCarthy, Melissa M.

AU - Walter, Arnaud

AU - Moon, Soo Jin

AU - Noel, Nakita K.

AU - O'Brien, Shane

AU - Pemble, Martyn E.

AU - Nicolay, Sylvain

AU - Wenger, Bernard

AU - Snaith, Henry J.

AU - Povey, Ian M.

PY - 2018

Y1 - 2018

N2 - Amorphous TiO2 and SnO2 electron transport layers (ETLs) were deposited by low-Temperature atomic layer deposition (ALD). Surface morphology and x-ray photoelectron spectroscopy (XPS) indicate uniform and pinhole free coverage of these ALD hole blocking layers. Both mesoporous and planar perovskite solar cells were fabricated based on these thin films with aperture areas of 1.04 cm2 for TiO2 and 0.09 cm2 and 0.70 cm2 for SnO2. The resulting cell performance of 18.3 % power conversion efficiency (PCE) using planar SnO2 on 0.09 cm2 and 15.3 % PCE using mesoporous TiO2 on 1.04 cm2 active areas are discussed in conjunction with the significance of growth parameters and ETL composition.

AB - Amorphous TiO2 and SnO2 electron transport layers (ETLs) were deposited by low-Temperature atomic layer deposition (ALD). Surface morphology and x-ray photoelectron spectroscopy (XPS) indicate uniform and pinhole free coverage of these ALD hole blocking layers. Both mesoporous and planar perovskite solar cells were fabricated based on these thin films with aperture areas of 1.04 cm2 for TiO2 and 0.09 cm2 and 0.70 cm2 for SnO2. The resulting cell performance of 18.3 % power conversion efficiency (PCE) using planar SnO2 on 0.09 cm2 and 15.3 % PCE using mesoporous TiO2 on 1.04 cm2 active areas are discussed in conjunction with the significance of growth parameters and ETL composition.

KW - atomic layer deposition

KW - perovskites

KW - photovoltaic

KW - thin film

UR - https://www.scopus.com/pages/publications/85054807137

U2 - 10.1557/adv.2018.515

DO - 10.1557/adv.2018.515

M3 - Article

AN - SCOPUS:85054807137

SN - 2731-5894

VL - 3

SP - 3075

EP - 3084

JO - MRS Advances

JF - MRS Advances

IS - 51

ER -

Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices

Abstract

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Keywords

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