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Atomic layer deposition of HfO2 on III-V semiconductors - An interfacial chemistry perspective

  • W. Cabrera
  • , H. Dong
  • , B. Brennan
  • , E. O'Connor
  • , P. Carolan
  • , R. Galatage
  • , S. Monaghan
  • , I. Povey
  • , P.K. Hurley
  • , C.L. Hinkle
  • , Y. Chabal
  • , R.M. Wallace

Research output: Chapter in Book/Report/Conference proceedingsConference proceedingpeer-review

Original languageUndefined/Unknown
Title of host publicationAtomic layer deposition of HfO2 on III-V semiconductors - An interfacial chemistry perspective
Publication statusPublished - 2013

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