TY - JOUR
T1 - Atomic Layer Deposition of Intermetallic Fe4Zn9 Thin Films from Diethyl Zinc
AU - Ghiyasi, Ramin
AU - Philip, Anish
AU - Liu, Ji
AU - Julin, Jaakko
AU - Sajavaara, Timo
AU - Nolan, Michael
AU - Karppinen, Maarit
N1 - Publisher Copyright:
© 2022 The Authors. Published by American Chemical Society.
PY - 2022/6/14
Y1 - 2022/6/14
N2 - We present a new type of atomic layer deposition (ALD) process for intermetallic thin films, where diethyl zinc (DEZ) serves as a coreactant. In our proof-of-concept study, FeCl3 is used as the second precursor. The FeCl3 + DEZ process yields in situ crystalline Fe4Zn9 thin films, where the elemental purity and Fe/Zn ratio are confirmed by time-of-flight elastic recoil detection analysis (TOF-ERDA), Rutherford backscattering spectrometry (RBS), atomic absorption spectroscopy (AAS), and energy-dispersive X-ray spectroscopy (EDX) analyses. The film thickness is precisely controlled by the number of precursor supply cycles, as expected for an ALD process. The reaction mechanism is addressed by computational density functional theory (DFT) modeling. We moreover carry out preliminary tests with CuCl2 and Ni(thd)2 in combination with DEZ to confirm that these processes yield Cu−Zn and Ni−Zn thin films with DEZ as well. Thus, we envision an opening of a new ALD approach based on DEZ for intermetallic/metal alloy thin films.
AB - We present a new type of atomic layer deposition (ALD) process for intermetallic thin films, where diethyl zinc (DEZ) serves as a coreactant. In our proof-of-concept study, FeCl3 is used as the second precursor. The FeCl3 + DEZ process yields in situ crystalline Fe4Zn9 thin films, where the elemental purity and Fe/Zn ratio are confirmed by time-of-flight elastic recoil detection analysis (TOF-ERDA), Rutherford backscattering spectrometry (RBS), atomic absorption spectroscopy (AAS), and energy-dispersive X-ray spectroscopy (EDX) analyses. The film thickness is precisely controlled by the number of precursor supply cycles, as expected for an ALD process. The reaction mechanism is addressed by computational density functional theory (DFT) modeling. We moreover carry out preliminary tests with CuCl2 and Ni(thd)2 in combination with DEZ to confirm that these processes yield Cu−Zn and Ni−Zn thin films with DEZ as well. Thus, we envision an opening of a new ALD approach based on DEZ for intermetallic/metal alloy thin films.
UR - https://www.scopus.com/pages/publications/85137685058
U2 - 10.1021/acs.chemmater.2c00907
DO - 10.1021/acs.chemmater.2c00907
M3 - Article
AN - SCOPUS:85137685058
SN - 0897-4756
VL - 34
SP - 5241
EP - 5248
JO - Chemistry of Materials
JF - Chemistry of Materials
IS - 11
ER -