Atomic layer deposition of metal silicates as scalable high-k metal-insulator-metal capacitors with low leakage, high breakdown fields and improved voltage linearity

Research output: Chapter in Book/Report/Conference proceedingsConference proceeding

Original languageUndefined/Unknown
Title of host publicationAVS-ALD & Baltic ALD 2012
Publication statusPublished - 18 Jun 2012

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