Atomic scale simulation of a junctionless silicon nanowire transistor

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Abstract

We have simulated silicon nanowire junctionless transistors with a 3 nm gate length within a Density Functional Theory (DFT) framework. We explored the response of transistors to source-drain bias, VDS, and gate voltage, Vg. Also, the effect of bulk and surface adatom in the wire cross section was evaluated.

Original languageEnglish
Title of host publication2011 12th International Conference on Ultimate Integration on Silicon, ULIS 2011
Pages96-98
Number of pages3
DOIs
Publication statusPublished - 2011
Event2011 12th International Conference on Ultimate Integration on Silicon, ULIS 2011 - Cork, Ireland
Duration: 14 Mar 201116 Mar 2011

Publication series

Name2011 12th International Conference on Ultimate Integration on Silicon, ULIS 2011

Conference

Conference2011 12th International Conference on Ultimate Integration on Silicon, ULIS 2011
Country/TerritoryIreland
CityCork
Period14/03/1116/03/11

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