Attomolar streptavidin and pH, low power sensor based on 3D vertically stacked SiNW FETs

  • Elizabeth Buitrago
  • , Montserrat Fernandez-Bolanos
  • , Yordan M. Georgiev
  • , Yu Ran
  • , Olan Lotty
  • , Justin D. Holmes
  • , Adrian M. Nightingale
  • , Adrian M. Ionescu

Research output: Chapter in Book/Report/Conference proceedingsConference proceedingpeer-review

Abstract

3D vertically stacked silicon nanowire (SiNW) field effect transistors (FET) with high density arrays (up to 7×20) of fully depleted and ultra-thin (15-30 nm) suspended channels were fabricated by a top-down CMOS compatible process on silicon on insulator (SOI). The channels can be wrapped by conformal high-κ gate dielectrics (HfO2) and their conductivity can be excellently controlled either by a reference electrode or by three local gates; a backgate (BG) and two symmetrical Pt side-gates (SG) offering unique sensitivity tuning. Such 3D structure has been (3-Aminopropyl)-triethoxysilane (APTES) functionalized and biotynilated for pH and streptavidin (protein) sensing, respectively. An ultra-low concentration of 17 aM of streptavidin was measured, the lowest ever reported in literature. Extremely high quasi-exponential drain current responses (ΔI d/pH) of ∼0.70 dec/pH were measured for structures with APTES functionalized SiO2 gate dielectrics when operated in the subthreshold regime. Also, high drain current responses > 20 μA/pH and high sensitivities (S ∼ 95%) were measured for structures with a native oxide gate dielectrics when operated in the strong-inversion regime.

Original languageEnglish
Title of host publicationProceedings of Technical Program - 2014 International Symposium on VLSI Technology, Systems and Application, VLSI-TSA 2014
PublisherIEEE Computer Society
ISBN (Print)9781479922178
DOIs
Publication statusPublished - 2014
Event2014 International Symposium on VLSI Technology, Systems and Application, VLSI-TSA 2014 - Hsinchu, Taiwan, Province of China
Duration: 28 Apr 201430 Apr 2014

Publication series

NameProceedings of Technical Program - 2014 International Symposium on VLSI Technology, Systems and Application, VLSI-TSA 2014

Conference

Conference2014 International Symposium on VLSI Technology, Systems and Application, VLSI-TSA 2014
Country/TerritoryTaiwan, Province of China
CityHsinchu
Period28/04/1430/04/14

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