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Beyond-Si materials and devices for more Moore and more than Moore applications

  • N. Collaert
  • , A. Alian
  • , H. Arimura
  • , G. Boccardi
  • , G. Eneman
  • , J. Franco
  • , Ts Ivanov
  • , D. Lin
  • , J. Mitard
  • , S. Ramesh
  • , R. Rooyackers
  • , M. Schaekers
  • , A. Sibaya-Hernandez
  • , S. Sioncke
  • , Q. Smets
  • , A. Vais
  • , A. Vandooren
  • , A. Veloso
  • , A. Verhulst
  • , D. Verreck
  • N. Waldron, A. Walke, L. Witters, H. Yu, X. Zhou, A. V.Y. Thean

Research output: Chapter in Book/Report/Conference proceedingsConference proceedingpeer-review

Abstract

In this work, we will review the current progress in high mobility devices and new device architectures. With main focus on (Si)Ge for pMOS and In(Ga)As for nMOS, the benefits and challenges of integrating these materials on a Si platform will be discussed. Next to that, the advantages of tunnel FETs, vertical logic and in general heterogeneous integration will be highlighted.

Original languageEnglish
Title of host publicationIEEE Joint Conference - International Conference on IC Design and Technology, ICICDT 2016 and Solid State Systems Symposium, 4S 2016
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9781509008278
DOIs
Publication statusPublished - 10 Aug 2016
Externally publishedYes
Event2016 IEEE Joint Conference on International Conference on IC Design and Technology, ICICDT 2016 and Solid State Systems Symposium, 4S 2016 - Ho Chi Minh City, Viet Nam
Duration: 27 Jun 201629 Jun 2016

Publication series

NameIEEE Joint Conference - International Conference on IC Design and Technology, ICICDT 2016 and Solid State Systems Symposium, 4S 2016

Conference

Conference2016 IEEE Joint Conference on International Conference on IC Design and Technology, ICICDT 2016 and Solid State Systems Symposium, 4S 2016
Country/TerritoryViet Nam
CityHo Chi Minh City
Period27/06/1629/06/16

Keywords

  • heterogeneous integration
  • high mobility materials
  • tunnel FET
  • vertical devices

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