Block copolymer lithography: Feature size control and extension by an over-etch technique

Sozaraj Rasappa; Dipu Borah; Ramsankar Senthamaraikannan; Colm C. Faulkner; Matthew T. Shaw; Peter Gleeson; Justin D. Holmes; Michael A. Morris

doi:10.1016/j.tsf.2012.09.017

Block copolymer lithography: Feature size control and extension by an over-etch technique

Sozaraj Rasappa
, Dipu Borah
, Ramsankar Senthamaraikannan
, Colm C. Faulkner
, Matthew T. Shaw
, Peter Gleeson
, Justin D. Holmes
, Michael A. Morris

School of Chemistry

Research output: Contribution to journal › Article › peer-review

Abstract

Block copolymer lithography based on block copolymer (BCP) self-assembly can be used to develop soft mask nanoscale templates for subsequent pattern transfer to generate substrate features. Self-assembly of lamellar polystyrene-b-polymethylmethacrylate BCP of varying molecular weights to generate silicon nanoscale features is reported here. It has also been demonstrated that the feature size can be controlled by a plasma over-etch process and discussed.

Original language	English
Pages (from-to)	318-323
Number of pages	6
Journal	Thin Solid Films
Volume	522
DOIs	https://doi.org/10.1016/j.tsf.2012.09.017
Publication status	Published - 1 Nov 2012

Keywords

Block copolymer
Lithography
Over-etching
Plasma etching
Polystyrene-b-polymethylmethacrylate
Self-assembly
Silicon nanowires

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10.1016/j.tsf.2012.09.017

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title = "Block copolymer lithography: Feature size control and extension by an over-etch technique",

abstract = "Block copolymer lithography based on block copolymer (BCP) self-assembly can be used to develop soft mask nanoscale templates for subsequent pattern transfer to generate substrate features. Self-assembly of lamellar polystyrene-b-polymethylmethacrylate BCP of varying molecular weights to generate silicon nanoscale features is reported here. It has also been demonstrated that the feature size can be controlled by a plasma over-etch process and discussed.",

keywords = "Block copolymer, Lithography, Over-etching, Plasma etching, Polystyrene-b-polymethylmethacrylate, Self-assembly, Silicon nanowires",

author = "Sozaraj Rasappa and Dipu Borah and Ramsankar Senthamaraikannan and Faulkner, \{Colm C.\} and Shaw, \{Matthew T.\} and Peter Gleeson and Holmes, \{Justin D.\} and Morris, \{Michael A.\}",

year = "2012",

month = nov,

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doi = "10.1016/j.tsf.2012.09.017",

language = "English",

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journal = "Thin Solid Films",

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T2 - Feature size control and extension by an over-etch technique

AU - Rasappa, Sozaraj

AU - Borah, Dipu

AU - Senthamaraikannan, Ramsankar

AU - Faulkner, Colm C.

AU - Shaw, Matthew T.

AU - Gleeson, Peter

AU - Holmes, Justin D.

AU - Morris, Michael A.

PY - 2012/11/1

Y1 - 2012/11/1

N2 - Block copolymer lithography based on block copolymer (BCP) self-assembly can be used to develop soft mask nanoscale templates for subsequent pattern transfer to generate substrate features. Self-assembly of lamellar polystyrene-b-polymethylmethacrylate BCP of varying molecular weights to generate silicon nanoscale features is reported here. It has also been demonstrated that the feature size can be controlled by a plasma over-etch process and discussed.

AB - Block copolymer lithography based on block copolymer (BCP) self-assembly can be used to develop soft mask nanoscale templates for subsequent pattern transfer to generate substrate features. Self-assembly of lamellar polystyrene-b-polymethylmethacrylate BCP of varying molecular weights to generate silicon nanoscale features is reported here. It has also been demonstrated that the feature size can be controlled by a plasma over-etch process and discussed.

KW - Block copolymer

KW - Lithography

KW - Over-etching

KW - Plasma etching

KW - Polystyrene-b-polymethylmethacrylate

KW - Self-assembly

KW - Silicon nanowires

UR - https://www.scopus.com/pages/publications/84868593394

U2 - 10.1016/j.tsf.2012.09.017

DO - 10.1016/j.tsf.2012.09.017

M3 - Article

AN - SCOPUS:84868593394

SN - 0040-6090

VL - 522

SP - 318

EP - 323

JO - Thin Solid Films

JF - Thin Solid Films

ER -

Block copolymer lithography: Feature size control and extension by an over-etch technique

Abstract

Keywords

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