Boron diffusion in amorphous silicon and the role of fluorine
- R. Duffy
- , V. C. Venezia
- , A. Heringa
- , B. J. Pawlak
- , M. J.P. Hopstaken
- , G. C.J. Maas
- , Y. Tamminga
- , T. Dao
- , F. Roozeboom
- , L. Pelaz
- Koninklijke Philips N.V.
- University of Valladolid
Research output: Contribution to journal › Article › peer-review