Boron diffusion in amorphous silicon
- V. C. Venezia
- , R. Duffy
- , L. Pelaz
- , M. J.P. Hopstaken
- , G. C.J. Maas
- , T. Dao
- , Y. Tamminga
- , P. Graat
- Koninklijke Philips N.V.
- University of Valladolid
Research output: Contribution to journal › Article › peer-review