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Challenges on surface conditioning in 3D device architectures: Triple-gate finfets, gate-all-around lateral and vertical nanowire FETs

  • A. Veloso
  • , V. Paraschiv
  • , E. Vecchio
  • , K. Devriendt
  • , W. Li
  • , E. Simoen
  • , B. T. Chan
  • , Z. Tao
  • , E. Rosseel
  • , R. Loo
  • , A. P. Milenin
  • , B. Kunert
  • , L. Teugels
  • , F. Sebaai
  • , C. Lorant
  • , D. Van Dorp
  • , E. Altamirano-Sánchez
  • , S. Brus
  • , P. Marien
  • , C. Fleischmann
    • D. Melkonyan, T. Huynh-Bao, G. Eneman, G. Hellings, A. Sibaja-Hernandez, P. Matagne, N. Waldron, D. Mocuta, N. Collaert
  • Interuniversitair Micro-Elektronica Centrum

Research output: Chapter in Book/Report/Conference proceedings › Conference proceeding › peer-review

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