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Characterisation of HfO
2
deposited by photo-induced chemical vapour deposition
Q. Fang
, J. Y. Zhang
, Z. M. Wang
, J. X. Wu
, B. J. O'Sullivan
,
P. K. Hurley
, T. L. Leedham
, H. Davies
, M. A. Audier
, C. Jimenez
, J. P. Senateur
, Ian W. Boyd
Tyndall
Tyndall MicroNano Systems
Tyndall Photonics
School of Chemistry
University College London
University of Science and Technology of China
University College Cork
INORG-TECH
Institut polytechnique de Grenoble
J.I.P. Elec
Research output
:
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2
deposited by photo-induced chemical vapour deposition'. Together they form a unique fingerprint.
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Engineering
Vapor Deposition
100%
Chemical Vapor Deposition
100%
Refractive Index
33%
Refractivity
33%
Deposition Rate
33%
FTIR Spectroscopy
33%
Injection System
33%
Substrate Temperature
33%
Reaction Chamber
33%
Excimer Lamp
33%
Deposition Parameter
33%
Carrier Gas
33%
System Pressure
33%
X Ray Diffraction
33%
Material Science
Film
100%
Chemical Vapor Deposition
100%
Refractive Index
20%
X-Ray Diffraction
20%
Fourier Transform Infrared Spectroscopy
20%
Physical Property
20%
Annealing
20%
Lamp
20%
Interface Property
20%
Hafnium
20%