Abstract
The angular wavelet analysis is applied to the study of the spatial distribution of breakdown (BD) spots in Pt/HfO2/Pt capacitors with square and circular areas. The method is originally developed for rectangular areas, so a zoomed approach needs to be considered when the observation window does not coincide with the device area. The BD spots appear as a consequence of the application of electrical stress to the device. The stress generates defects within the dielectric film, a process that ends with the formation of a percolation path between the electrodes and the melting of the top metal layer because of the high release of energy. The BD spots have lateral sizes ranging from 1 μm to 3 μm and they appear as a point pattern that can be studied using spatial statistics methods. In this paper, we report the application of the angular wavelet method as a complementary tool for the analysis of the distribution of failure sites in large-area metal–insulator–metal (MIM) devices. The differences between considering a continuous or a discrete wavelet and the role played by the number of BD spots are also investigated.
| Original language | English |
|---|---|
| Pages (from-to) | 5033-5038 |
| Number of pages | 6 |
| Journal | Journal of Electronic Materials |
| Volume | 47 |
| Issue number | 9 |
| DOIs | |
| Publication status | Published - 1 Sep 2018 |
Keywords
- high-k
- Oxide breakdown
- spatial statistics
- wavelet analysis