Chemical Vapor Deposition of MoS2 for Back-End-of-Line Applications

Jun Lin; Scott Monaghan; Neha Sakhuja; Farzan Gity; Ravindra Kumar Jha; Emma Coleman; James Connolly; Conor Cullen; Lee Walsh; Teresa Mannarino; Michael Schmidt; Brendan Sheehan; Georg Duesberg; Niall Mc Evoy; Navakanta Bhat; Paul Hurley; Ian Povey; Shubhadeep Bhattacharjee

doi:10.1149/MA2021-02311952mtgabs

Chemical Vapor Deposition of MoS2 for Back-End-of-Line Applications

Jun Lin
, Scott Monaghan
, Neha Sakhuja
, Farzan Gity
, Ravindra Kumar Jha
, Emma Coleman
, James Connolly
, Conor Cullen
, Lee Walsh
, Teresa Mannarino
, Michael Schmidt
, Brendan Sheehan
, Georg Duesberg
, Niall Mc Evoy
, Navakanta Bhat
, Paul Hurley
, Ian Povey
, Shubhadeep Bhattacharjee

Research output: Contribution to journal › Article › peer-review

Original language	Undefined/Unknown
Journal	ECS Meeting Abstracts
DOIs	https://doi.org/10.1149/MA2021-02311952mtgabs
Publication status	Published - 19 Oct 2021

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Cite this

Lin, J., Monaghan, S., Sakhuja, N., Gity, F., Jha, R. K., Coleman, E., Connolly, J., Cullen, C., Walsh, L., Mannarino, T., Schmidt, M., Sheehan, B., Duesberg, G., Evoy, N. M., Bhat, N., Hurley, P., Povey, I., & Bhattacharjee, S. (2021). Chemical Vapor Deposition of MoS2 for Back-End-of-Line Applications. ECS Meeting Abstracts. https://doi.org/10.1149/MA2021-02311952mtgabs

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title = "Chemical Vapor Deposition of MoS2 for Back-End-of-Line Applications",

author = "Jun Lin and Scott Monaghan and Neha Sakhuja and Farzan Gity and Jha, \{Ravindra Kumar\} and Emma Coleman and James Connolly and Conor Cullen and Lee Walsh and Teresa Mannarino and Michael Schmidt and Brendan Sheehan and Georg Duesberg and Evoy, \{Niall Mc\} and Navakanta Bhat and Paul Hurley and Ian Povey and Shubhadeep Bhattacharjee",

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doi = "10.1149/MA2021-02311952mtgabs",

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TY - JOUR

T1 - Chemical Vapor Deposition of MoS2 for Back-End-of-Line Applications

AU - Lin, Jun

AU - Monaghan, Scott

AU - Sakhuja, Neha

AU - Gity, Farzan

AU - Jha, Ravindra Kumar

AU - Coleman, Emma

AU - Connolly, James

AU - Cullen, Conor

AU - Walsh, Lee

AU - Mannarino, Teresa

AU - Schmidt, Michael

AU - Sheehan, Brendan

AU - Duesberg, Georg

AU - Evoy, Niall Mc

AU - Bhat, Navakanta

AU - Hurley, Paul

AU - Povey, Ian

AU - Bhattacharjee, Shubhadeep

PY - 2021/10/19

Y1 - 2021/10/19

UR - https://doi.org/10.1149/MA2021-02311952mtgabs

U2 - 10.1149/MA2021-02311952mtgabs

DO - 10.1149/MA2021-02311952mtgabs

M3 - Article

JO - ECS Meeting Abstracts

JF - ECS Meeting Abstracts

ER -

Chemical Vapor Deposition of MoS2 for Back-End-of-Line Applications

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