Chemical Vapor Deposition of MoS2 for Back-End-of-Line Applications

Jun Lin; Scott Monaghan; Neha Sakhuja; Farzan Gity; Ravindra Kumar Jha; Emma Coleman; James Connolly; Conor Cullen; Lee Walsh; Teresa Mannarino; Michael Schmidt; Brendan Sheehan; Georg Duesberg; Niall Mc Evoy; Navakanta Bhat; Paul Hurley; Ian Povey; Shubhadeep Bhattacharjee

doi:10.1149/MA2021-02311952mtgabs

Chemical Vapor Deposition of MoS2 for Back-End-of-Line Applications

Jun Lin
, Scott Monaghan
, Neha Sakhuja
, Farzan Gity
, Ravindra Kumar Jha
, Emma Coleman
, James Connolly
, Conor Cullen
, Lee Walsh
, Teresa Mannarino
, Michael Schmidt
, Brendan Sheehan
, Georg Duesberg
, Niall Mc Evoy
, Navakanta Bhat
, Paul Hurley
, Ian Povey
, Shubhadeep Bhattacharjee

Research output: Contribution to journal › Meeting abstract › peer-review

Original language	English
Journal	ECS Meeting Abstracts
DOIs	https://doi.org/10.1149/MA2021-02311952mtgabs
Publication status	Published - 19 Oct 2021

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Lin, J., Monaghan, S., Sakhuja, N., Gity, F., Jha, R. K., Coleman, E., Connolly, J., Cullen, C., Walsh, L., Mannarino, T., Schmidt, M., Sheehan, B., Duesberg, G., Evoy, N. M., Bhat, N., Hurley, P., Povey, I., & Bhattacharjee, S. (2021). Chemical Vapor Deposition of MoS2 for Back-End-of-Line Applications. ECS Meeting Abstracts. https://doi.org/10.1149/MA2021-02311952mtgabs

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title = "Chemical Vapor Deposition of MoS2 for Back-End-of-Line Applications",

author = "Jun Lin and Scott Monaghan and Neha Sakhuja and Farzan Gity and Jha, \{Ravindra Kumar\} and Emma Coleman and James Connolly and Conor Cullen and Lee Walsh and Teresa Mannarino and Michael Schmidt and Brendan Sheehan and Georg Duesberg and Evoy, \{Niall Mc\} and Navakanta Bhat and Paul Hurley and Ian Povey and Shubhadeep Bhattacharjee",

year = "2021",

month = oct,

day = "19",

doi = "10.1149/MA2021-02311952mtgabs",

language = "English",

journal = "ECS Meeting Abstracts",

}

TY - JOUR

T1 - Chemical Vapor Deposition of MoS2 for Back-End-of-Line Applications

AU - Lin, Jun

AU - Monaghan, Scott

AU - Sakhuja, Neha

AU - Gity, Farzan

AU - Jha, Ravindra Kumar

AU - Coleman, Emma

AU - Connolly, James

AU - Cullen, Conor

AU - Walsh, Lee

AU - Mannarino, Teresa

AU - Schmidt, Michael

AU - Sheehan, Brendan

AU - Duesberg, Georg

AU - Evoy, Niall Mc

AU - Bhat, Navakanta

AU - Hurley, Paul

AU - Povey, Ian

AU - Bhattacharjee, Shubhadeep

PY - 2021/10/19

Y1 - 2021/10/19

UR - https://doi.org/10.1149/MA2021-02311952mtgabs

U2 - 10.1149/MA2021-02311952mtgabs

DO - 10.1149/MA2021-02311952mtgabs

M3 - Meeting abstract

JO - ECS Meeting Abstracts

JF - ECS Meeting Abstracts

ER -

Chemical Vapor Deposition of MoS2 for Back-End-of-Line Applications

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