Cobalt Metal ALD: Understanding the mechanism and role of zinc alkyl precursors as reductants for low-resistivity co thin films
- David Zanders
- , Ji Liu
- , Jorit Obenlüneschloß
- , Claudia Bock
- , Detlef Rogalla
- , Lukas Mai
- , Michael Nolan
- , Seán T. Barry
- , Anjana Devi
- Ruhr University Bochum
- Carleton University
Research output: Contribution to journal › Article › peer-review