Conformal doping of FINFET's: A fabrication and metrology challenge

  • W. Vandervorst
  • , P. Eyben
  • , M. Jurzack
  • , B. Pawlak
  • , R. Duffy

Research output: Chapter in Book/Report/Conference proceedingsConference proceedingpeer-review

Original languageEnglish
Title of host publication2008 International Symposium on VLSI Technology, Systems and Applications, VLSI-TSA
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages158
Number of pages1
ISBN (Print)9781424416158
DOIs
Publication statusPublished - 2008
Externally publishedYes
Event2008 International Symposium on VLSI Technology, Systems and Applications, VLSI-TSA - Hsinchu, Taiwan, Province of China
Duration: 21 Apr 200823 Apr 2008

Publication series

NameInternational Symposium on VLSI Technology, Systems, and Applications, Proceedings
ISSN (Print)1930-8868

Conference

Conference2008 International Symposium on VLSI Technology, Systems and Applications, VLSI-TSA
Country/TerritoryTaiwan, Province of China
CityHsinchu
Period21/04/0823/04/08

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