CVD-grown back-gated MoS2transistors

Research output: Chapter in Book/Report/Conference proceedingsConference proceedingpeer-review

Abstract

In this work, the electrical performance and reliability of scalable CVD-grown MoS2 transistors have been evaluated. Transfer and output characteristics, hysteresis and low-frequency noise signature have been characterized revealing the influence of surface and oxide interfaces and the disturbance due to number of carrier fluctuations on the back-gated transistor response.

Original languageEnglish
Title of host publication2020 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon, EUROSOI-ULIS 2020
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9781728187655
DOIs
Publication statusPublished - 1 Sep 2020
Event2020 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon, EUROSOI-ULIS 2020 - Caen, France
Duration: 1 Sep 202030 Sep 2020

Publication series

Name2020 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon, EUROSOI-ULIS 2020

Conference

Conference2020 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon, EUROSOI-ULIS 2020
Country/TerritoryFrance
CityCaen
Period1/09/2030/09/20

Fingerprint

Dive into the research topics of 'CVD-grown back-gated MoS2transistors'. Together they form a unique fingerprint.

Cite this