DC and RF Characterization of Nano-ridge HBT Technology Integrated on 300 mm Si Substrates

  • S. Yadav
  • , A. Vais
  • , R. Y. Elkashlan
  • , L. Witters
  • , K. Vondkar
  • , Y. Mols
  • , A. Walke
  • , H. Yu
  • , R. Alcotte
  • , M. Ingels
  • , P. Wambacq
  • , R. Langer
  • , B. Kunert
  • , N. Waldron
  • , B. Parvais
  • , N. Collaert

Research output: Chapter in Book/Report/Conference proceedingsChapterpeer-review

Abstract

Performance and complexity of next-generation communication systems can be enhanced by the realization of III-V materials on large-area Si substrates and their heterogenous integration with Si-CMOS. In this paper, a GaAs/InGaP HBT technology which is integrated on 300 mm Si substrates using nano-ridge engineering is described. DC and RF characterization of the devices is presented, and device characteristics are explained using physical modeling. The impact of nano-ridge sidewall on device DC performance is studied in detail. Further, a RF small-signal model applicable to these devices is proposed and guidelines for further improvements in RF performance are discussed.

Original languageEnglish
Title of host publicationEuMIC 2020 - 2020 15th European Microwave Integrated Circuits Conference
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages89-92
Number of pages4
ISBN (Electronic)9782874870606
Publication statusPublished - 10 Jan 2021
Externally publishedYes
Event15th European Microwave Integrated Circuits Conference, EuMIC 2020 - Utrecht, Netherlands
Duration: 11 Jan 202112 Jan 2021

Publication series

NameEuMIC 2020 - 2020 15th European Microwave Integrated Circuits Conference

Conference

Conference15th European Microwave Integrated Circuits Conference, EuMIC 2020
Country/TerritoryNetherlands
CityUtrecht
Period11/01/2112/01/21

Keywords

  • 5G
  • heterogenous integration
  • III-V HBTs on Si

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