Defect evolution and dopant activation in laser annealed Si and Ge
- F. Cristiano
- , M. Shayesteh
- , R. Duffy
- , K. Huet
- , F. Mazzamuto
- , Y. Qiu
- , M. Quillec
- , H. H. Henrichsen
- , P. F. Nielsen
- , D. H. Petersen
- , A. La Magna
- , G. Caruso
- , S. Boninelli
- Université Fédérale Toulouse Midi-Pyrénées
- University College Cork
- SCREEN Holdings Co., Ltd.
- Interuniversitair Micro-Elektronica Centrum
- Probion Analysis
- CAPRES A/S
- Technical University of Denmark
- National Research Council of Italy
- University of Catania
Research output: Contribution to journal › Article › peer-review