Dielectric characterization for novel high-k thin films using microwave techniques

Research output: Chapter in Book/Report/Conference proceedingsConference proceedingpeer-review

Abstract

This paper addresses the issue of novel high-k material thin film characterization through wafer-probe measurements and electromagnetic simulation (EM) of coplanar waveguides. The dielectric constant of an alumina substrate has been successfully extracted from s-parameter measurements of a coplanar waveguide. Verification lines on the impedance standard substrate (ISS) substrates have been used as a method to test a dielectric constant extraction technique and also to test the accuracy of EM simulations. The characteristic impedance and the effective dielectric constant for CPW are predicted using electromagnetic simulation.

Original languageEnglish
Title of host publicationChina-Ireland International Conference on Information and Communications Technologies, CIICT 2008
Pages631-634
Number of pages4
Edition544 CP
DOIs
Publication statusPublished - 2008
EventChina-Ireland International Conference on Information and Communications Technologies, CIICT 2008 - Beijing, China
Duration: 26 Sep 200828 Sep 2008

Publication series

NameIET Conference Publications
Number544 CP

Conference

ConferenceChina-Ireland International Conference on Information and Communications Technologies, CIICT 2008
Country/TerritoryChina
CityBeijing
Period26/09/0828/09/08

Keywords

  • Coplanar waveguide (CPW)
  • Dielectric characterization
  • Microwave measurements
  • Thin film

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