Diffusion, activation, and regrowth behavior of high dose P implants in Ge
- A. Satta
- , E. Simoen
- , R. Duffy
- , T. Janssens
- , T. Clarysse
- , A. Benedetti
- , M. Meuris
- , W. Vandervorst
- Interuniversitair Micro-Elektronica Centrum
- Koninklijke Philips N.V.
Research output: Contribution to journal › Article › peer-review