Diffusion of In0. 53Ga0. 47As elements through hafnium oxide during post deposition annealing

W Cabrera; B Brennan; H Dong; Terrance P O'Regan; Ian M Povey; Scott Monaghan; Éamon O'Connor; Paul K Hurley; RM Wallace; YJ Chabal

Diffusion of In0. 53Ga0. 47As elements through hafnium oxide during post deposition annealing

W Cabrera
, B Brennan
, H Dong
, Terrance P O'Regan
, Ian M Povey
, Scott Monaghan
, Éamon O'Connor
, Paul K Hurley
, RM Wallace
, YJ Chabal

Tyndall MicroNano Systems

Research output: Contribution to journal › Article › peer-review

Original language	Undefined/Unknown
Journal	Applied Physics Letters
Publication status	Published - 2014

Cite this

@article{612ca93bb45e472fb1fcea75244d708a,

title = "Diffusion of In0. 53Ga0. 47As elements through hafnium oxide during post deposition annealing",

author = "W Cabrera and B Brennan and H Dong and O'Regan, \{Terrance P\} and Povey, \{Ian M\} and Scott Monaghan and {\'E}amon O'Connor and Hurley, \{Paul K\} and RM Wallace and YJ Chabal",

year = "2014",

language = "Undefined/Unknown",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics",

}

TY - JOUR

T1 - Diffusion of In0. 53Ga0. 47As elements through hafnium oxide during post deposition annealing

AU - Cabrera, W

AU - Brennan, B

AU - Dong, H

AU - O'Regan, Terrance P

AU - Povey, Ian M

AU - Monaghan, Scott

AU - O'Connor, Éamon

AU - Hurley, Paul K

AU - Wallace, RM

AU - Chabal, YJ

PY - 2014

Y1 - 2014

M3 - Article

SN - 0003-6951

JO - Applied Physics Letters

JF - Applied Physics Letters

ER -