Direct imaging of 0.81 μm and 0.98 μm tapered and broad stripe semiconductor laser diodes

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Abstract

Tapered gain region lasers and amplifiers can produce diffraction limited output powers up to several watts in continuous wave (CW) operation. They are relatively easy to fabricate and are integratable with other elements. Analyzing the optical field inside the cavity is highly desirable for a more detailed understanding of the modal structure and filamentation which affects the spatial coherence. A technique which allows to image the interiors of semiconductor lasers during high power operation is developed. The results from the analysis of tapered and broad stripe lasers operating at 0.81 μm and 0.98 μm are presented.

Original languageEnglish
Pages (from-to)409-410
Number of pages2
JournalConference Proceedings - Lasers and Electro-Optics Society Annual Meeting-LEOS
Volume2
Publication statusPublished - 1997
Externally publishedYes
EventProceedings of the 1997 10th IEEE Lasers and Electro-Optics Society Annual Meeting, LEOS. Part 2 (of 2) - San Francisco, CA, USA
Duration: 10 Nov 199713 Nov 1997

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