Double polysilicon capacitors in 1 μm analogue CMOS technology

Research output: Chapter in Book/Report/Conference proceedingsConference proceedingpeer-review

Abstract

In this paper we present a combined experimental and theoretical investigation of the capacitance-voltage behaviour of n+polysilicon/oxide/n+polysilicon (double polysilicon) capacitors. The theoretical models for the capacitance-voltage behaviour are compared to experimental results, and used to predict how the voltage coefficients of the double polysilicon capacitor are influenced by technological factors such as doping concentration and oxide thickness. For the first time the theoretical solution is derived using the complete Fermi-Dirac statistics to account for the degenerate doping levels present in the polysilicon films.

Original languageEnglish
Title of host publicationESSDERC 1993 - Proceedings of the 23rd European Solid State Device Research Conference
EditorsJ. P. Noblanc, P. Gentil, M. Verdone, J. Borel, A. Nouailhat
PublisherIEEE Computer Society
Pages569-572
Number of pages4
ISBN (Electronic)2863321358
ISBN (Print)9782863321355
Publication statusPublished - 1993
Event23rd European Solid State Device Research Conference, ESSDERC 1993 - Grenoble, France
Duration: 13 Sep 199316 Sep 1993

Publication series

NameEuropean Solid-State Device Research Conference
ISSN (Print)1930-8876

Conference

Conference23rd European Solid State Device Research Conference, ESSDERC 1993
Country/TerritoryFrance
CityGrenoble
Period13/09/9316/09/93

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