Abstract
The effect of the AlGaN electron blocking layer (EBL) thickness on the electrical and optical properties of 310 nm AlGaN single quantum well (SQW) light-emitting diodes (LEDs) has been investigated. A large ideality factor extracted from the current-voltage (I-V) characteristics indicates that a tunneling mechanism dominates the carrier transport process in the LEDs. The ideality factor decreases with increasing EBL thickness suggesting that deep-level state assisted tunneling is reduced. In addition, the QW emission intensity is enhanced with the introduction of an EBL due to the reduction of electron overflow to the p-type layer. The QW emission intensity is sensitive to the EBL thickness. This is attributed to the reduction of electron tunneling to the p-type layer with an EBL.
| Original language | English |
|---|---|
| Pages (from-to) | 2857-2859 |
| Number of pages | 3 |
| Journal | Journal of Crystal Growth |
| Volume | 311 |
| Issue number | 10 |
| DOIs | |
| Publication status | Published - 1 May 2009 |
| Externally published | Yes |
Keywords
- A3. Metalorganic vapor phase epitaxy
- A3. Quantum wells
- B1. AlGaN
- B3. Light-emitting diodes
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