Effect of the AlGaN electron blocking layer thickness on the performance of AlGaN-based ultraviolet light-emitting diodes

  • K. B. Lee
  • , P. J. Parbrook
  • , T. Wang
  • , J. Bai
  • , F. Ranalli
  • , R. J. Airey
  • , G. Hill

Research output: Contribution to journalArticlepeer-review

Abstract

The effect of the AlGaN electron blocking layer (EBL) thickness on the electrical and optical properties of 310 nm AlGaN single quantum well (SQW) light-emitting diodes (LEDs) has been investigated. A large ideality factor extracted from the current-voltage (I-V) characteristics indicates that a tunneling mechanism dominates the carrier transport process in the LEDs. The ideality factor decreases with increasing EBL thickness suggesting that deep-level state assisted tunneling is reduced. In addition, the QW emission intensity is enhanced with the introduction of an EBL due to the reduction of electron overflow to the p-type layer. The QW emission intensity is sensitive to the EBL thickness. This is attributed to the reduction of electron tunneling to the p-type layer with an EBL.

Original languageEnglish
Pages (from-to)2857-2859
Number of pages3
JournalJournal of Crystal Growth
Volume311
Issue number10
DOIs
Publication statusPublished - 1 May 2009
Externally publishedYes

Keywords

  • A3. Metalorganic vapor phase epitaxy
  • A3. Quantum wells
  • B1. AlGaN
  • B3. Light-emitting diodes

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