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Effective-mass model of surface scattering in locally oxidized Si nanowires

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Abstract

We present a simple model to describe the lowest-subbands surface scattering in locally oxidized silicon nanowires grown in the [110] direction. To this end, we employ an atomistically scaled effective mass model projected from a three-dimensional effective mass equation and apply a quantum transport formalism to calculate the conductance for typical potential profiles. Comparison of our results with hole-transport calculations using atomistic models in conjuction with Density Functional Theory (DFT) points to an intra-subband scattering mechanism from a potential well.

Original languageEnglish
Title of host publicationProceedings of the 10th International Conference on ULtimate Integration of Silicon, ULIS 2009
Pages253-256
Number of pages4
DOIs
Publication statusPublished - 2009
Event10th International Conference on ULtimate Integration of Silicon, ULIS 2009 - Aachen, Germany
Duration: 18 Mar 200920 Mar 2009

Publication series

NameProceedings of the 10th International Conference on ULtimate Integration of Silicon, ULIS 2009

Conference

Conference10th International Conference on ULtimate Integration of Silicon, ULIS 2009
Country/TerritoryGermany
CityAachen
Period18/03/0920/03/09

Keywords

  • Intraband scattering
  • Oxidation
  • Silicon nanowires

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